Custom patterned ITO glass circuits, ITO coating, selective etching, substrate cutting, 2um min line width

Complete solutions of

Custom designed ITO (Ag, Au or other conductive material) coated on glass or PET film

Coating thickness: 10nm~10um

Coatings:ITO, FTO, CNB, CNT, a-Si, nano-Ag, Graphene, Ag, Al, Au, SiO2 ,etc

Subsrtate: Glass, ceramics, PET, plastic, some metal substrates

Patern min line width: 2~10um (R&D),  recommend above 20um(production)

Any custom shape/patterns in CAD drawing

Max dimension:1000*2000mm

au-etching

Medical sensor(blood glucose meter) of Au patterning on PET substrate

The process was developed several years ago for touch panel industry, which now is successfully replaced the wet etching process. And with long time developing and higher requirements from mobile phone industry, this process is completed and used in many other applications, mainly for developing or manufacturing sensor or circuits for OLED, medical, solar cell, consumer electronics, and many R&D cases.

We have done a lot of cases with different materials coated on different substrates, the typical one is ITO patterning, With the different absorption rates of laser, we could remove some material and no hurt to the substrate. The coating thickness usually less than 10um, and most of them is less than 1um.

The strength of this process is that it could etch 20/20um patterns which makes it possible to design the whole pattern very small and tight, and easy CAD input helps the designers have a fast prototyping and demonstration.And recently we have succeed in making a 2um line width pattern for a world-famous company in laboratory. In addtion, with improved technologies, double sides coating and patterning of different design is also possible

patterned-glass-transparent-circuits

Transparent circuits (  Transparant ITO glass with customized patterns)

Resistance: 4~ 100 Ohm or any specially required

Transparent rate (ITO): >80% depends on the coating thickness and resistence requirements

Conductive material:  ITO, CNB, CNT, nano-Ag, Graphene, and all kinds of metal coating, etc.

ito-patterning

Min etching line width:  20um

Custom circuits area: 600*600mm

ITO single layer and double layer etching, other coating film etching, such as Ag, Al, Si removing

Precision: +/-10um

Alignment: 5um

Any patterns of CAD output

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Metal(aluminum) coating on glass patterning

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20~30um line width and pitch(* the min line width & pitch could be 10um)

Application: touch panel, OLED, solar cell, electronics, medical, etc

ito-patterning-2

 ITO patterning under microscope

Posted in ITO